Home Contact Request Quote
VIN KAROLA INSTRUMENTSSputtering Targets

Up
R_D/OEM/Design
System Integration
Single Crystal Wafers
Substrates
RF Generators
Sputtering Targets
High Purity Materials
Vacuum Products
Lasers/Controllers
Photodiodes/Detectors
Optics/Filters
Fiber Optics
ITO Coated Glass
Mass Flow Controllers
Microwave & RF
Gas Chromatography
Electro-Optics
Syringe Pumps
Evaporation Sources
Much More...



     
  Sputtering Targets

 

bullet

Purity up to 99.9999%

bullet

Target sizes from 1” dia. to 8” dia.

bullet

Thickness from 1/8” to 1/4"

bullet

High quality at lower prices

bullet

OFHC backing plates

bullet

Target bonding (solder/epoxy) available

bullet

Analysis provided

 

Use our various Vanadium Oxide (VO2, V2O3, V2O5) Sputtering Targets to deposit thin films on sapphire substrates.

VO2 = Vanadium (IV) Oxide

V2O3 = Vanadium (III) Oxide

V2O5 = Vanadium (V) Oxide

Please inquire for details of items not listed or shown here.

 

Copyright 2003-2008 VIN KAROLA INSTRUMENTS. All rights reserved.

 
 

Please enquire about our

Gold

 

Platinum Silver 

and 

Boron

Targets